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Location: Main > Optical Mirrors > Metal Folding Mirrors > MFM-W-0150-1500-A40
Name: DIA15.0xT15.0mm Metal Mirror(Tungsten) 40deg
P/N: MFM-W-0150-1500-A40
Keywords:Dia15.0xT15.0mm Tungsten, Angled 40deg (wedge)
Unit Price: S$1,120.00/pc
Available: Call us
Request: Add to Request List
Introduction:
Tungsten mirrors are a crucial component in high-power laser and X-ray systems, as well as in other areas of optical research. They are valued for their exceptional properties, which include a high melting point, resistance to extreme environments, and good thermal and optical characteristics. Their primary applications are in environments where conventional mirrors would fail due to intense heat, radiation, or mechanical stress.

Applications in Optical Research & Photonics
High-Power Lasers: In high-power laser systems, especially those operating at petawatt (PW) and terawatt (TW) levels, mirrors must withstand enormous energy densities without damage or distortion. Tungsten and its alloys, like thoriated tungsten, are excellent for this purpose due to their high thermal conductivity and low thermal expansion. This combination allows them to dissipate heat efficiently, minimizing thermal distortion and maintaining beam quality.

X-ray Optics: Conventional mirrors fail to reflect X-rays at normal incidence because these high-energy photons pass through most materials. Tungsten mirrors are used in X-ray optics in two main ways:

Grazing Incidence: By reflecting X-rays at extremely shallow angles (grazing incidence), a mirror can be designed to capture and focus the beam. Tungsten is a material of choice for these mirrors due to its high density (high-Z material), which enhances reflection at these angles.

Multilayer Mirrors: For applications requiring normal or near-normal incidence, tungsten is used as a high-density layer in a multilayer mirror stack. Alternating thin layers of a high-Z material (like tungsten) and a low-Z material (like silicon or carbon) create a structure that uses constructive interference to reflect specific X-ray wavelengths. This is particularly important in fields like X-ray astronomy and extreme ultraviolet (EUV) lithography.