| SiC Wafers Substrates |
| P/N: | SIC Series |
| Introduction: | As the 3rd generation semiconductor, silicon carbide possesses wide band-gap,excellent thermal conductivity,high breakdown field strength, saturated electron drift velocity,m echanical hardness and anti-radiation, which
are superior to that of conventional semiconductor materials including silicon (Si) and gallium arsenide (GaAs) greatly. Unique properties have hastened SiC to find applications in fabricating high temperature, high frequency, high power and high radiation, and optoelectronic devices during recent years. Besides, small lattice and thermal expansion mismatches with III-group nitride make SiC an outstanding substrate material for the epitaxial growth of nitride films.
Main Applications:
Power electronic devices: Schottky diodes, MOSFET, JFET, BJT, PiN diodes,IGBT etc.
Optoelectronic devices: GaN/SiC LED. |
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Optical Substrates
Optical Crystals Ceramics
Laser Crystals Ceramics SHG THG Cry
