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Location: Main > Photomask Reticle > Soda Lime Glass Photomasks Reticles > PHMK-SL-S9-10
Name: 9"x9" SL Glass Photomask CD10um(SL9012)(T3mm)
P/N: PHMK-SL-S9-10
Keywords:9"x9"xT0.12"(3.0mm),SL Glass,Photomask,CD10um
Unit Price: S$1,940.00/pc
Available: Call us
Request: Add to Request List
Introduction:
Masks are integral components in the lithographic process of semiconductor manufacturing. They contain transparent substrate which covered patterned opaque layer on it. This architecture used in lithography to block resist exposure in selected area and transfer circuit patterns from mask to wafer for mass prodcution.

We can provide 1x photomasks and 5x Wafer Stepper Reticles and others with Minium feature size (CD) of 1.0 micrometer. These photomasks are either direct-written on e-beam or laser systems or are manufactured from reticles using photorepeater system.

Tighter specifications and/or other plate sizes are available upon request. Contact us for more information to meet your needs.

Substrate Material:
Soda Lime Glass
Outer Dimension:
9"x9"(228.6x228.6mm)
Thickness of Glass:
0.12"(3.0mm)
Coating Material:
Chrome
Critical Dimension:
10um (minimal feature size; for vertical or horizontal linewidth/spacing; Please check with us if any dots or rings with diameter of 10um)
Tolerance:
+/-0.5um (higher price for smaller tolerance)
Orientation:
Definition:
Chrome-Up: Looking from chrome side(not through the glass); chrome patterns on upper surface of mask glass when seeing from mask top side(same pattern view as mask design of PDF/jpg image) 
Chrome-Down: chrome patterns on down/rear/back surface of mask glass when seeing (through glass)from mask top side(same pattern view as mask design of PDF/jpg image)
Drawing format:
GDS or DWG
Lead Time: 3-5 days after final layout plot double confirmed by customer

 
 
 
 
 
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