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Location: Main > Photomask Reticle > Quartz Glass Photomasks Reticles > PHMK-QZ-S4-01
Name: 4"x4"x0.09" Quartz Glass Photomask CD1um(QZ4009)
P/N: PHMK-QZ-S4-01
Keywords:4"x4"x0.09",Quartz Glass,CD1um,+/-0.2um,Photomask
Unit Price: S$2,380.00/pc
Available: Call us
Request: Add to Request List
Introduction:
Masks are integral components in the lithographic process of semiconductor manufacturing. They contain transparent substrate which covered patterned opaque layer on it. This architecture used in lithography to block resist exposure in selected area and transfer circuit patterns from mask to wafer for mass prodcution.

We can providing 1x photomasks and 5x Wafer Stepper Reticles and others with Minium feature size (CD) of 0.1 micrometer. These photomasks are either direct-written on e-beam or laser systems or are manufactured from reticles using photorepeater system.

Tighter specifications and/or other plate sizes are available upon request. Contact us for more information to meet your needs.
Substrate Material:  Quartz Glass
Outer Dimension:  4"x4"
Thickness:  2.3mm (0.09")
Coating Material:  Chrome
Critical Dimension:  1um (minimum feature size of lines or squares typ)
Tolerance:  +/-0.2um (higher price for smaller tolerance) 
Orientation:

 Chrome up: Looking from chrome side (not through the glass);

 Chrome down: Looking from chrome side

Drawing format:  GDS or DWG